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ARGHYA NARAYAN BANERJEE, Ph.D

RESEARCH FACULTY

DEPARTMENT OF AEROSPACE ENGINEERING SCIENCES;

UNIVERSITY OF COLORADO at BOULDER; 429 UCB, BOULDER, CO - 80309-0429; USA.

Office Location: 1111 Engineering Drive, Engineering Center, Room ECAE 195

Ph: 303-735-3526 (O); 702-249-1796 (Cell); Fax: 303-492-4990

 

DOWNLOAD CV HERE

 

E-mail: arghya.banerjee@colorado.edu; abanerjee@colorado.edu; arghya75@gmail.com

Website: http://www.egr.unlv.edu/~arghya

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RESEARCH EXPERIENCE / INTEREST

  1. Novel non-lithographic high vacuum fabrication of complex nanostructures such as multilayer thin films containing Gr-IV and II-VI nanoparticles of uniform size-distribution, embedded within metals, insulators or semiconducting materials for diverse applications in nano-devices, nano-optics, field emitters etc.
  2. Growth of aligned CNT via PECVD process. Catalyzation of substrate is done in a UHV chamber with size-controlled (Ni, Co, Fe) nanoparticles with uniform size-distribution, which leads to the growth of CNTs having uniform diameter. Catalyzation unit and PECVD unit are connected via a magnetically coupled transfer chamber, which is always kept under UHV environment. Therefore, the CNTs are never exposed to atmosphere, leading to defect-free, clean growth of materials capable of producing high-efficient devices.
  3. Nano-scale non-lithographic pattering of quantum dots, compatible with silicon electronics.
  4. Growth of tantalum oxide nano-pillars within alumina templates by anodization process to use as mask for the potential fabrication of semiconductor quantum wire infrared photodetectors by a novel nonlithographic technique.
  5. Fabrication of anodic alumina template by electrochemical process on Si and GaAs substrates and its use as guiding path for the formation of CNTs as well as various semiconducting and metallic nanowires for potential applications in field-emission technology.
  6. Development of nanostructure based corrosion-barrier coatings on steel and various substrates for transmutation applications,
  7. Development of corrosion-resistance coatings on carbon nanotubes (CNT) for field-emission applications.
  8. Growth of metal quantum-dots and anti-dots as well as nano-rods on porous substrates by anodization process.
  9. Synthesis and characterizations of some p-type transparent conducting oxide thin films, such as, CuAlO2,  CuGaO2, SrCu2O2 etc. and some device fabrication (e.g. transparent diodes) from them for potential application in ‘Transparent Electronics’.
  10. Sol-Gel processing of some nano-crystalline thin films, such as, doped SnO2 (SnO2: F/Sb), doped zinc oxide (ZnO: Al) thin films etc.
  11. Wet-chemical synthesis of nano-fiber-structured ZnO thin films as well as CdS nano-particles and the study of their field emission properties.
  12. Synthesis and characterization of CuAlO2 nano-particles for potential applications in nano-devices.
  13. Thermoelectric properties of layered-structured materials, such as CuAlO2, NaCo2O4 etc. and determination of related parameters.
  14. Field-emission properties of wide-bandgap CuAlO2 thin films and explanation of emission mechanism.
  15. Preparation of some carbon based thin films e.g. diamond like carbon (DLC), cubic boron nitride (cBN), carbon nitride (CNx), diamond etc. and their characterizations.
  16. Electrolytic preparations of crystalline carbon nitride (C3N4) thin films.
  17. Deposition of transparent conducting oxide (TCO) thin films on plastic substrates for flexible display technology.

 

PROFESSIONAL EXPERIENCE

1.     Research Faculty, Department of Aerospace Engineering Sciences, University of Colorado, Boulder (UCB), US [Aug, 2008 onwards].

2.     Post-Doctoral Research Scientist, Nevada Nanotechnology Center, Department of Electrical and Computer Engineering, University of Nevada, Las Vegas (UNLV), US. [May, 2005 – May, 2008]

Areas of research:

  • Micro/Nanofabrication
  • Novel non-lithographic high vacuum fabrication of complex nanostructures such as multilayer thin films containing Gr-IV and II-VI nanoparticles of uniform size-distribution, embedded within metals, insulators or semiconducting materials for diverse applications in nano-devices, nano-optics, field emitters etc.
  • Nano-scale non-lithographic pattering of quantum dots, compatible with silicon electronics.
  • Development of nanostructure based corrosion-barrier coatings on steel and various substrates for transmutation applications.
  • Development of corrosion-resistance coatings on CNTs for field-emission applications.
  • Electrochemical and wet-chemical syntheses of metal and semiconducting nano-rods for various novel applications.

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EXPERTISE IN INSTRUMENT/APPARATUS

1.       Nano-Cluster deposition unit, containing quadruple mass-filter (QMF) by which nanoparticles of uniform size distribution (diameter as low as 0.5 nm) can be deposited. The same system contains e-beam evaporation as well as dc-pulsed sputtering source.

2.       A dual multi-deposition unit consists of a nano-cluster deposition system (with QMF, sputtering, e-beam and pulsed dc-sputter source) combined with PECVD system by a UHV, magnetically coupled transfer line to switch samples from one unit to another under high vacuum environment.

3.       Thin film coating unit (DC and RF-Magnetron sputtering, Thermal and PECVD, Hot-filament-CVD, Evaporation).

4.       Anodization and Electrochemical deposition system.

5.       Sol-Gel-Deposition Apparatus

6.       X-ray Diffraction (XRD) unit.

7.       Fourier Transform Infrared spectrometer (FT-IR).

8.       Transmission Electron Microscope (TEM).

9.       SEM with Energy Dispersive X-ray (EDX) attachment.

10.    FESEM.

11.    UV-Vis-NIR spectrophotometer.

12.    Photoluminescence apparatus.

13.    AFM with STM and SPM.

14.    Surface Profiler.

15.    Ellipsometer.

16.    L-C-R meter.

17.    Electrical measurements by standard (Four-probe) apparatus.

18.    High sensitive AC-resistance bridge.

19.    Hall apparatus.

 

PROFESSIONAL TRAINING

I.        Certified JSM-6700F SEM Operations Training Course in The JEOL Institute, Peabody, Massachusetts, USA.

II.      Certified ASME, 4th Nano-Boot Camp Training, University of Minnesota, Minneapolis, MN, USA.

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TEACHING EXPERIENCE

I.        Guest lecturer in The Department of Physics; New Alipore College, Kolkata, West Bengal, India.

                Courses taken:      1.     Analog and Digital Electronics, B.Sc. (Undergrad-Physics-Honors) Part-I & II,

                                                2.     Solid State Physics, B.Sc. (Undergrad-Physics-Honors) Part-I & II,

                                                3.     Electronics and Communication, B.Sc. (Undergrad-General),

                                                4.     Practical laboratory classes taken in B.Sc (Undergrad – Physics-Honors) and B. Sc. (Undergrad-General).

II.      Undergrad Engg. (B.E): Courses on Quantum Mechanics taken in the Department of Electronics and Telecommunication Engg.., Jadavpur University, Kolkata, India.

III.   Undergrad Engg. (B.E): Courses on Optics and Solid State Physics taken in the Department of Mechanical Engg. Jadavpur University, Kolkata, India.         

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EDUCATIONAL QUALIFICATIONS

Doctoral:

From Thin Film and Nano-Science Laboratory, Department of Physics, Jadavpur University (JU), Kolkata, India, in 2005.

Area of research:

·        Synthesis and characterization of some nanocrystalline thin films like zinc oxide, tin oxide etc. as well as fabrication of some nanocrystalline p-type transparent conducting oxide thin films and nano-active device fabrication from them, for potential applications in "Transparent Electronics".

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Masters (Post-Graduation):

From University of Calcutta (CU), Kolkata, India, in the year of 1999, with Physics as major and Electronics and Communication as special subject.

Bachelors (Graduation):

From St. Xavier’s College (SXC), Kolkata, India, in the year 1997, with Physics as a major subject.

Schooling:

From R. K. Mission Vidyalaya (RKMV), Narendrapur; 24 Pgs (S), West Bengal; India in the year 1992.

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MERIT AWARD

1. Medal Winner for Merit Award in the Science Aptitude & Talent Search Test, 1990, organized by All India Science Teachers Association.

2. National Scholarship winner for Securing 50th rank in Madhyamik Pariksha (10th) 1992, awarded by Ministry of Human Resource Development, Govt. of India.

3. Winner of CSIR Junior Research Fellowship, 2001, awarded by Council of Scientific & Industrial Research, Human Resource Development Group, Govt. of India.

4. Winner of CSIR Senior Research Fellowship, 2003, awarded by Council of Scientific & Industrial Research, Human Resource Development Group, Govt. of India.

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NEWS COVERAGE

1. Channel 8 coverage of UNLV-NNC activities, Dec. 25, 2007

2. Coverage of UNLV Nanotechnology program in Las Vegas Sun, 04/09/2006

3. UNLV Nanotechnology program headlines in Las Vegas Sun, 05/28/2006

4. KLAS TV (Channel 8) coverage of UNLV Nanotechnology Program, 2005

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MEMBERSHIP OF PROFESSIONAL SOCIETIES

·         American Physical Society (APS)

·         American Society of Mechanical Engineers (ASME)

·         Indian Physical Society (IPS)

·         Materials Research Society of India (MRSI)

·         Electron Microscopy Society of India (EMSI)

·         Reviewer of Elsevier and Wiley journals

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RECENT LIST OF PUBLICATIONS

BOOK

1.       Introduction to Nanoscience and Technology, Arghya Banerjee, Kalyan K Chattopadhyay, Prentice Hall, ND, India (Expected date of publication: September, 2008)

2.      P-Type Transparent Semiconducting Delafossite CuAlO2+x Thin Film, Arghya Banerjee, Kalyan K. Chattopadhyay, Nova Science Publisher, NY, USA (Expected Date of Publication: 4th quarter 2008)

 

BOOK CHAPTERS

3.       ‘P-Type Transparent Semiconducting Delafossite CuAlO2+x Thin Film: Promising Material For Optoelectronic Devices and Field-Emission Displays’, A. N. Banerjee and K. K. Chattopadhyay in “Materials Science Research Trends”, Ed. M. B. Olivante, Nova Science Publishers, NY, USA; Ch. 1, pp. 1-116.

4.       "Reactive-Sputtered Wide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for ‘Transparent Electronics’”, A. N. Banerjee and K. K. Chattopadhyay in “Reactive Sputter Deposition”, Eds. S. Mahieu and D Depla, Springer , NY, USA; Ch. 12, 413-484.

 

REVIEW ARTICLES

5.       Nanostructured p-Type Semiconducting Transparent Oxides: Promising Materials for Nano-Active Devices and the Emerging Field of “Transparent Nanoelectronics”, Arghya Banerjee, Kalyan K. Chattopadhyay, Recent Patents on Nanotechnology 2 (1) (2008) 41-68.

6.       Recent Developments in the Emerging Field of Crystalline P-Type Transparent Conducting Oxide Thin Films, A. N. Banerjee, K. K. Chattopadhyay, Progress in Crystal Growth and Characterization of Materials 50 (2005) 52-105.

 

ARCHIVAL JOURNAL ARTICLES

7.       An ultra-high vacuum CMOS compatible nonlithographic system to fabricate nanoparticle-based devices, Arghya Banerjee, Biswajit Das, Rev. of Sci. Instrum 79 (2008) 033910.

8.       Size Controlled deposition of Cu and Si Nano-Clusters by an Ultra-High Vacuum Sputtering Gas Aggregation Technique; R. Krisna, A. Banerjee, B. Das, Appl. Phys. A 90 (2008) 299-303.

9.       Electro-optical Properties of All-Oxide p-CuAlO2/n-ZnO: Al Transparent Heterojunction Thin Film Diode Fabricated on Glass Substrate; Arghya Banerjee, K. K. Chattopadhyay, Central European J. Phys 6(1) (2008) 57-63.

10.    Implementation of Complex Nanosystems using a Versatile Ultrahigh Vacuum Nonlithographic Technique; Biswajit Das, Arghya Banerjee, Nanotechnology 18 (2007) 445202.

11.    Fabrication and Characterization of All-Oxide Heterojunction p-CuAlO2+x/ n-Zn1-xAlxO Transparent Diode for Potential Application in “Invisible Electronics”; A. N. Banerjee, S. Nandy, C. K. Ghosh and K. K. Chattopadhyay Thin Solid Films 515 (18) (2007) 7324-7330.

12.    Low-Temperature Deposition of ZnO Thin Films on PET and Glass Substrates by DC-Sputtering Technique; A. N. Banerjee, C. K. Ghosh, K. K. Chattopadhyay, Hideki Minoura, Ajay K. Sarkar, Atsuya Akiba, Atsushi  Kamiya, Tamio Endo, Thin Solid Films 496 (2006) 112-116.

13.    Electro-Optical Characteristics and Field-Emission Properties of Reactive D. C. Sputtered p-CuAlO2+x Thin Films, A. N. Banerjee, C. K. Ghosh, S. Das, K. K. Chattopadhyay, Physica B 370 (2005) 264-276.

14.    Size-Dependent Optical Properties of Sputter-Deposited Nanocrystalline P-type Transparent CuAlO2 Thin Films; A. N. Banerjee, K. K. Chattopadhyay, J. Appl. Phys 97 (2005) 084308.

15.    Effect of Excess Oxygen on the Electrical Properties of Transparent P-Type Conducting CuAlO2+x thin films; A. N. Banerjee, C. K. Ghosh, K. K. Chattopadhyay, Sol. Energy Mater. Solar Cells 89 (2005) 75-83.

16.    Thermoelectric Properties and Electrical Characteristics of Sputter-Deposited P-CuAlO2 Thin Films; A. N. Banerjee, R. Maity, P. K. Ghosh, K. K. Chattopadhyay, Thin Solid Films 474 (2005) 261 – 266.

17.    Low-Threshold Field-Emission from Transparent P-Type Conducting CuAlO2 Thin Film Prepared by D. C. Sputtering; A. N. Banerjee, K. K. Chattopadhyay, Applied Surface Science 225 (2004) 243 – 249.

18.    Poole - Frenkel Effect in Nanocrystalline SnO2: F Thin Films Prepared by Sol-Gel-Dip-Coating Technique; A. N. Banerjee, R. Maity, S. Kundoo, K.K. Chattopadhyay, Physica Status Solidi (A) 201 (2004) 983 – 989.

19.    Low-Macroscopic Field Emission from Fibrous ZnO Thin Film Prepared by Catalyst-Free Solution Route; R. Maity, A. N. Banerjee, K. K. Chattopadhyay, Applied Surface Science 236 (2004) 231-235.

20.    Synthesis of Boron Doped Diamond Films by DC Plasma CVD Using CH4 + CO2 + H2 Gas Mixture at Lower Substrate Temperature and Formation of n-Si / p-Diamond Heterojunction. P. Saha, S. Kundoo, A. N. Banerjee, K. K. Chattopadhyay, Vacuum 72 (2004) 129 –134.

21.    Synthesis and Characterization of P-Type Transparent Conducting CuAlO2 Thin Film by D.C. Sputtering; A.N. Banerjee, S. Kundoo, K.K. Chattopadhyay, Thin Solid Films 440 (2003) 5 – 10.